Andrew Chang, John Imamura, and Shin Akiya
Sponsored
By: LMA Industrial Affiliates
Abstract
Current
research efforts in the area of Chemical Mechanical Planarization have led to the
development of various models relating to aspects of the process. The application of
these models is unfortunately difficult to realize because of their complex form or
necessity for in-depth understanding about subtle process characteristics in order to
successfully apply the model. We propose here to develop a suite of software tools to
help demonstrate these CMP models. While the software will be aimed to help researchers
simulate and characterize the distinctions between various models, it will also provide
"educational" value by allowing users without specific CMP domain knowledge, namely
students and outside researchers, to interactively simulate process models.
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