Jianfeng
Luo
Sponsored
By: NSF and UC SMART
Abstract
Three
regions of material removal with the increase of abrasive weight concentrations
have been proposed in the first part of this paper [1]. The transition
of the regions and the corresponding material removal rate formulations
are functions of slurry chemicals, abrasive size distribution and wafer-pad
contact area. In this paper, experimental evidence supporting the proposed
model and formulations is discussed. Further experimental results supporting
the model from other aspects in the future can help a better understanding
on the chemical-mechanical polishing and its optimization.
Keywords:
abrasive size distribution, chemical-mechanical polishing, material
removal rate, passivation, slurry.
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